Beamline: BXDS

Contact: Beatriz Diaz Moreno

An endstation optimized for investigating transformations of thin films and multilayer structures during rapid thermal treatments in-situ.

• Samples can be rapidly heated to 1273 K (+1000 °C) under vacuum or ultra high purity gas such as He or N2.
• XRD with linear strip detector. 640 pixels of 125 µm x 8 mm, a maximum count rate of 105 Hz per pixel, and 30 ms minimum readout time.
• In-situ roughness and 4-point resistance probes.
• Robotic sample loading (up to 96 at one time), automated, remote access is default.